Atomic layer deposition (ALD) is a thin film deposition technique that is based on the sequential use of a gas phase chemical process. The majority of ALD reactions use two chemicals referred to as ...

The samples prepared in inert ambient can be coated with ALD without having to expose the samples to the atmosphere. While we only use edited and approved content for Azthena answers, it may on ...

Lesker Company offer stand-alone ALD systems for basic research or completely integrated deposition systems for complex R&D applications. All of our ALD system platforms feature high speed ALD valves ...

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