来自MSN2 个月
美国研发新型BAT激光器:EUV能源效率提升10倍!具体来说,ASML EUV光刻机的光源分为两个部分:第一个部分就是通快集团供应的30KW二氧化碳激光器,也称之为“drive laser”,其主要作用就是提供 ...
Although higher flux levels will be needed to achieve higher data collection rates, for many applications this is mostly a question of scaling the power of the ultrafast drive laser. The EUV pulse ...
However, the move from 193 nm excimer laser technology to 13.5 nm EUV technology has been far from straightforward, for a number of reasons. First, because EUV light is absorbed by air (in ...
来自MSN2 个月
American lab is developing a BAT laser that could enable 'beyond EUV' lithography, provide ...The Lawrence Livermore National Laboratory is working on a petawatt-class thulium laser that is said to be 10 times more efficient than the CO2 lasers used in EUV tools and could replace CO2 ...
Looking forward, EUV and high-NA EUV undoubtedly will drive advanced-node semiconductor manufacturing ... EUV lithography relies on high-energy laser sources to generate extreme ultraviolet light at a ...
BEIJING: Chinese scientists announced they have built a facility that can generate the world's brightest extreme ultraviolet (EUV) free electron laser. The facility in Dalian, a coastal city in ...
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