Intel将会使用High-NA EUV光刻机生产14A也就是1.4nm级工艺产品 ，但具体时间和产品未定，有可能在2026年左右量产，或许用于未来的Nova Lake、Razer Lake。

快科技2月25日消息，Intel宣布，ASML首批两台高数值孔径（High-NA EUV）极紫光刻机已经在其工厂投入生产。初步数据显示，其效率、可靠性比上一代EUV ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

Based on Tiktok and X, a picture of a Chinese machine with the bold inscription “EUV” is circulating. Many conclude from this that China could soon be producing chips using highly complex ...

EUV technology has matured ... to the source's angle that optimizes the optical transmission through the illuminator to maximize efficiency. However, the new system has a halved exposure field ...

During the last quarter, Intel kept up a steady pace with the manufacture of 30,000 wafers.ts most recent high-NA EUV machines nearly match the performance of earlier EUV systems, yet they deliver ...