Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography.

Extreme Ultraviolet Lithography (EUVL) is a cutting-edge technology used in the semiconductor manufacturing process to create extremely small patterns on silicon wafers. This technique relies on ...

Demand for AI chips is growing exponentially, but costs and complexity limit the technology to a handful of companies. That ...

A research partnership led by Lawrence Livermore National Laboratory (LLNL) has been formed to investigate the next evolution of extreme ultraviolet (EUV) lithography. The team will participate in the ...

The piece of equipment that the entire world has come to rely on—and she is specially trained to handle—is called an extreme ultraviolet lithography machine. It’s the machine that produces ...

Corning has introduced its new ultra-low expansion (ULE) material that is designed to withstand ever increasing power of ...

Acquired by Intel in 2015, IMS Nanofabrication is a Vienna, Austria-based business that develops multi-beam masking tools that are required to develop advanced extreme ultraviolet lithography ...