China is set to mass-produce complex EUV systems as early as 2026. However, this does not seem particularly realistic.

Russia's ZNTC and Belarus's Planar have completed the development of a 350nm-class lithography system, but despite its ...

Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

Since the 1980s, cutting-edge lithography has shifted from the 365 nm 'i-line' of mercury vapour lamps to deep-ultraviolet light from excimer lasers at 248 nm (krypton fluoride lasers) and 193 nm ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

To build these tiny features, a lithography machine works in stages by etching patterns of transistors and metal wires on a wafer, layer by layer. A single wafer can contain hundreds of chips.

Samsung Electronics reportedly deployed its first high-NA Extreme Ultraviolet (EUV) lithography machine at its Hwaseong ...

[Zach] decided to use his electron microscope as an e-beam litho machine; although not designed for lithography, it has the same basic components as a real EBL machine and can act as a substitute ...