Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography ...

This was followed by the Extreme Ultraviolet Explorer (EUVE), which launched in 1992 and conducted the first all-sky survey of far-UV sources. Then came the Far Ultraviolet Spectroscopic Explorer ...